Benefits of Neonyx®
Addressing today's material challenges
- Minimized impurities and inclusions
- Optimized process yield and performance
- Improved total cost of ownership
Enabling next generation node sizes
- For all semiconductor processes
- Synthetic thermal management
Providing consistency for the future
- Fully controlled raw material supply
- No natural variations
- High volume availability
Neonyx® Synthetic Fused Silica Portfolio
Neonyx HSQ-T
Developed for your batch furnace applications, Neonxy HSQ-T offers you all the benefits of Heraeus HSQ combined with the advanced properties of synthetic quartz material, while keeping the available product portfolio unchanged. Neonyx HSQ-T is available as large diameter tube, small diameter tube, rod, ingot, plates, etc. to enable you to create a full batch furnace set from the same material grade: Neonyx HSQ-T!
Neonyx TSC-T
The material grade for next generation single wafer applications: Neonyx TSC-T. The superior properties of the established high performance materials TSC-3/4 are exceeded by Neonyx TSC-T, offering uniquely low levels of bubbles and materials inclusions to address the challenges of your high-end single wafer applications.
Neonyx OM
First synthetic grade white opaque material, offering the ability to full thermal management also at the increasing demands to material purity and material consistency.
Fields of Applications
Deposition and etching processes are one of the most critical processes in the semiconductor manufacturing chain. The on-going integration into the third dimension is presenting new and increasingly challenging requirements. Neonyx is the right material for these challenges. Read more about more about the specific processes below.
Downloads
Brochure: Heraeus Neonyx® - The New Synthetic Quartz Standard
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